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1

High aspect ratio patterning of photosensitive polyimide with low thermal expansion coefficient and low dielectric constant

Dick, Andrew R., Bell, William K., Luke, Brendan, Maines, Erin, Mueller, Brennen, Rawlings, Brandon, Kohl, Paul A., Grant Willson, C.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2016

Langue:

english

Fichier:

PDF, 1.61 MB

english, 2016

2

[ACS Symposium Series] Polymers for Microelectronics Volume 537 (Resists and Dielectrics) || Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols)

Thompson, Larry F., Willson, C. Grant, Tagawa, Seiichi

Année:

1993

Langue:

english

Fichier:

PDF, 1.13 MB

english, 1993

3

Planarizing material for reverse-tone step and flash imprint lithography

Ogawa, Tsuyoshi, Jacobsson, B. Michael, Deschner, Ryan, Bell, William, Lin, Michael W., Hagiwara, Yuji, Takei, Satoshi, Hanabata, Makoto, Willson, C. Grant

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 2.39 MB

english, 2014

4

Experimental Techniques for Detection of Components Extracted from Model 193 nm Immersion Lithography Photoresists

Taylor, J. Christopher, LeSuer, Robert J., Chambers, Charles R., Fan, Fu-Ren F., Bard, Allen J., Conley, Willard E., Willson, C. Grant

Journal:

Chemistry of Materials

Année:

2005

Langue:

english

Fichier:

PDF, 630 KB

english, 2005

5

Reactive fluorinated surfactant for step and flash imprint lithography

Ogawa, Tsuyoshi, Hellebusch, Daniel J., Lin, Michael W., Jacobsson, B. Michael, Bell, William, Willson, C. Grant

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2013

Langue:

english

Fichier:

PDF, 1.49 MB

english, 2013

6

Polarity-switching Top Coats for Silicon-containing Block Copolymer Orientation Control

Bates, Christopher M., Maher, Michael J., Thio, Anthony, Dean, Leon M., Cushen, Julia D., Durand, William J., Blachut, Greg, Li, Litan, Ellison, Christopher, Willson, C. Grant

Journal:

Journal of Photopolymer Science and Technology

Année:

2013

Langue:

english

Fichier:

PDF, 226 KB

english, 2013

7

Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists

Palmieri, Frank, Adams, Jacob, Long, Brian, Heath, William, Tsiartas, Pavlos, Willson, C. Grant

Journal:

Année:

2007

Langue:

english

Fichier:

PDF, 958 KB

english, 2007

8

Block Copolymer Lithography

Bates, Christopher M., Maher, Michael J., Janes, Dustin W., Ellison, Christopher J., Willson, C. Grant

Journal:

Année:

2014

Langue:

english

Fichier:

PDF, 1.93 MB

english, 2014

9

Mesoscale modeling: a study of particle generation and line-edge roughness

Chauhan, Siddharth, Somervell, Mark, Carcasi, Michael, Scheer, Steven, Bonnecaze, Roger T., Mack, Chris A., Grant Willson, C.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 3.07 MB

english, 2014

10

Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication

Costner, Elizabeth A., Lin, Michael W., Jen, Wei-Lun, Willson, C. Grant

Journal:

Annual Review of Materials Research

Année:

2009

Langue:

english

Fichier:

PDF, 2.31 MB

english, 2009

11

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Optical lithography simulation and photoresist optimization for photomask fabrication

Rathsack, Benjamen M., Tabery, Cyrus E., Scheer, Steven A., Pochkowski, Mike, Philbin, Cecilia E., Kalk, Franklin D., Henderson, Clifford L., Buck, Peter D., Willson, C. Grant, Conley, Will

Année:

1999

Langue:

english

Fichier:

PDF, 3.98 MB

english, 1999

12

Airborne contamination of a chemically amplified resist. 1. Identification of problem

MacDonald, Scott A., Hinsberg, William D., Wendt, H. Russell, Clecak, Nicholas J., Willson, C. Grant, Snyder, Clinton D.

Journal:

Chemistry of Materials

Année:

1993

Langue:

english

Fichier:

PDF, 4.85 MB

english, 1993

13

Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate

Havard, Jennifer M., Vladimirov, Nikolay, Fréchet, Jean M. J., Yamada, Shintaro, Willson, C. Grant, Byers, Jeffrey D.

Journal:

Année:

1999

Langue:

english

Fichier:

PDF, 230 KB

english, 1999

14

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Development of imprint materials for the Step and Flash Imprint Lithography process

Xu, Frank, Stacey, Nicholas A., Watts, Mike, Truskett, Van, McMackin, Ian, Choi, Jin, Schumaker, Philip, Thompson, Ecron, Babbs, Daniel, Sreenivasan, S. V., Willson, C. Grant, Schumaker, Norman, Macka

Année:

2004

Langue:

english

Fichier:

PDF, 559 KB

english, 2004

15

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - High Resolution Positive Photoresists

Hanabata, M., Furuta, A., Uemura, Y., Willson, C. Grant

Année:

1986

Langue:

english

Fichier:

PDF, 1.55 MB

english, 1986

16

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - Microplastic Structures

Feely, Wayne E., Willson, C. Grant

Année:

1986

Langue:

english

Fichier:

PDF, 18.99 MB

english, 1986

17

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS- b -PMOST

Cushen, Julia, Wan, Lei, Blachut, Gregory, Maher, Michael J., Albrecht, Thomas R., Ellison, Christopher J., Willson, C. Grant, Ruiz, Ricardo

Journal:

ACS Applied Materials & Interfaces

Année:

2015

Langue:

english

Fichier:

PDF, 2.82 MB

english, 2015

18

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Effect of molecular weight distribution on the dissolution properties of novolac blends

Tsiartas, Pavlos C., Simpson, Logan L., Qin, Anwei, Willson, C. Grant, Allen, Robert D., Krukonis, Val J., Gallagher-Wetmore, Paula M., Allen, Robert D.

Année:

1995

Langue:

english

Fichier:

PDF, 380 KB

english, 1995

19

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - High-index resist for 193-nm immersion lithography

Matsumoto, Kazuya, Costner, Elizabeth, Nishimura, Isao, Ueda, Mitsuru, Willson, C. Grant, Henderson, Clifford L.

Année:

2008

Langue:

english

Fichier:

PDF, 648 KB

english, 2008

20

Alicyclic Polymers for 193 nm Resist Applications: Lithographic Evaluation

Okoroanyanwu, Uzodinma, Byers, Jeffrey, Shimokawa, Tsutomu, Willson, C. Grant

Journal:

Chemistry of Materials

Année:

1998

Langue:

english

Fichier:

PDF, 168 KB

english, 1998

21

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Modeling parameter extraction for DNQ-novolak thick film resists

Henderson, Clifford L., Scheer, Steven A., Tsiartas, Pavlos C., Rathsack, Benjamen M., Sagan, John P., Dammel, Ralph R., Erdmann, Andreas, Willson, C. Grant

Année:

1998

Langue:

english

Fichier:

PDF, 2.14 MB

english, 1998

22

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - Synthesis And Lithographic Characterization Of A Novel Organosilicon Novolac Resin

Tarascon, Regine G., Shugard, Ann, Reichmanis, Elsa, Willson, C. Grant

Année:

1986

Langue:

english

Fichier:

PDF, 4.41 MB

english, 1986

23

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Understanding the photoresist surface-liquid interface for ArF immersion lithography

Conley, Will, Sturtevant, John L., LeSuer, Robert J., Fan, Frank F., Bard, Allen J., Taylor, Chris, Tsiartas, Pavlos, Willson, Grant, Romano, Andrew, Dammel, Ralph

Année:

2005

Langue:

english

Fichier:

PDF, 232 KB

english, 2005

24

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Carbon-rich cyclopolymers: their synthesis, etch resistance, and application to 193-nm microlithography

Pasini, Dario, Low, Eric, Meagley, Robert P., Frechet, Jean M. J., Willson, C. Grant, Byers, Jeff D., Conley, Will

Année:

1999

Langue:

english

Fichier:

PDF, 869 KB

english, 1999

25

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Novel functional nortricyclene polymers and copolymers for 248- and 193-nm chemically amplified resists

Niu, Qingshang J., Frechet, Jean M. J., Okoroanyanwu, Uzodinma, Byers, Jeff D., Willson, C. Grant, Tarascon-Auriol, Regine G.

Année:

1997

Langue:

english

Fichier:

PDF, 449 KB

english, 1997

26

Recent Advancements In Cycloolefin Based Resists For ArF Lithography.

Byers, Jeffrey, Patterson, Kyle, Cho, Sungseo, McCallum, Martin, Willson, C. Grant

Journal:

Journal of Photopolymer Science and Technology

Année:

1998

Langue:

english

Fichier:

PDF, 1.13 MB

english, 1998

27

What is the quality of clinical practice guidelines for the treatment of acute lateral ankle ligament sprains in adults? A systematic review

Green, Toni, Willson, Grant, Martin, Donna, Fallon, Kieran

Journal:

BMC Musculoskeletal Disorders

Année:

2019

Langue:

english

Fichier:

PDF, 1.15 MB

english, 2019

28

Study of the kinetics of step and flash imprint lithography photopolymerization

Michael D. Dickey, Ryan L. Burns, E. K. Kim, Steve C. Johnson, Nick A. Stacey, C. Grant Willson

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 200 KB

english, 2005

29

Kinetic parameters for step and flash imprint lithography photopolymerization

Michael D. Dickey, C. Grant Willson

Journal:

Année:

2006

Langue:

english

Fichier:

PDF, 203 KB

english, 2006

30

Advances in the design of organic resist materials

Scott A. MacDonald, Hiroshi Ito, C.Grant Willson

Journal:

Microelectronic Engineering

Année:

1983

Langue:

english

Fichier:

PDF, 1.85 MB

english, 1983

31

Thermal analysis for step and flash imprint lithography during UV curing process

Eui Kyoon Kim, C. Grant Willson

Journal:

Microelectronic Engineering

Année:

2006

Langue:

english

Fichier:

PDF, 195 KB

english, 2006

32

Selective dry etch process for step and flash imprint lithography

Ngoc V. Le, William J. Dauksher, Kathy A. Gehoski, Douglas J. Resnick, A.E. Hooper, Steve Johnson, Grant Willson

Journal:

Microelectronic Engineering

Année:

2005

Langue:

english

Fichier:

PDF, 612 KB

english, 2005

33

Step & flash imprint lithography

Douglas J. Resnick, S.V. Sreenivasan, C. Grant Willson

Journal:

Materials Today

Année:

2005

Langue:

english

Fichier:

PDF, 2.47 MB

english, 2005

34

Design of a positive resist for projection lithography in the mid-UV

Grant Willson, Robert Miller, Dennis McKean, Nicholas Clecak, Terry Tompkins, Donald Hofer, Josef Michl, John Downing

Journal:

Polymer Engineering & Science

Année:

1983

Langue:

english

Fichier:

PDF, 663 KB

english, 1983

35

Chemical amplification in the design of dry developing resist materials

Hiroshi Ito, C. Grant Willson

Journal:

Polymer Engineering & Science

Année:

1983

Langue:

english

Fichier:

PDF, 730 KB

english, 1983

36

Penultimate effect in radical copolymerization of 2-trifluoromethylacrylates

Hiroshi Ito, Brian C. Trinque, Paul Kasai, C. Grant Willson

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Année:

2008

Langue:

english

Fichier:

PDF, 197 KB

english, 2008

37

High-aspect ratio polymeric pillar arrays formed via electrohydrodynamic patterning

Michael D. Dickey, Allen Raines, Elizabeth Collister, Roger T. Bonnecaze, S. V. Sreenivasan, C. Grant Willson

Journal:

Journal of Materials Science

Année:

2008

Langue:

english

Fichier:

PDF, 373 KB

english, 2008

38

Resist materials

Scott A. MacDonald, Jean M.J. Frechet, Hiroshi Ito, C Grant Willson

Journal:

Microelectronic Engineering

Année:

1985

Langue:

english

Fichier:

PDF, 109 KB

english, 1985

39

Night-to-night variability in sleep in cystic fibrosis

Maree A Milross, Amanda J Piper, Mark Norman, Grant N Willson, Ronald R Grunstein, Colin E Sullivan, Peter T.P Bye

Journal:

Année:

2002

Langue:

english

Fichier:

PDF, 96 KB

english, 2002

40

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

Gates, Byron D., Xu, Qiaobing, Stewart, Michael, Ryan, Declan, Willson, C. Grant, Whitesides, George M.

Journal:

Chemical Reviews

Année:

2005

Langue:

english

Fichier:

PDF, 1.27 MB

english, 2005

41

The Future of Lithography: SEMATECH Litho Forum 2008

Willson, C. Grant, Roman, Bernard J.

Journal:

Année:

2008

Langue:

english

Fichier:

PDF, 713 KB

english, 2008

42

Study of a Two-Stage Photobase Generator for Photolithography in Microelectronics

Turro, Nicholas J., Li, Yongjun, Jockusch, Steffen, Hagiwara, Yuji, Okazaki, Masahiro, Mesch, Ryan A., Schuster, David I., Willson, C. Grant

Journal:

Journal of Organic Chemistry

Année:

2013

Langue:

english

Fichier:

PDF, 2.66 MB

english, 2013

43

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Photoresist characterization for lithography simulation: IV. Processing effects on resist parameters

Henderson, Clifford L., Tsiartas, Pavlos C., Flanagin, Lewis W., Pancholi, Sanju, Chowdhury, Sajed A., Dombrowski, Katherine D., Chinwalla, Ammar N., Willson, C. Grant, Tarascon-Auriol, Regine G.

Année:

1997

Langue:

english

Fichier:

PDF, 472 KB

english, 1997

44

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Photoresist characterization for lithography simulation: III. Development parameter measurements

Henderson, Clifford L., Tsiartas, Pavlos C., Pancholi, Sanju, Chowdhury, Sajed A., Dombrowski, Katherine D., Willson, C. Grant, Dammel, Ralph R., Tarascon-Auriol, Regine G.

Année:

1997

Langue:

english

Fichier:

PDF, 399 KB

english, 1997

45

Ordering poly(trimethylsilyl styrene- block - D , L -lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents

Cushen, Julia D., Wan, Lei, Pandav, Gunja, Mitra, Indranil, Stein, Gila E., Ganesan, Venkat, Ruiz, Ricardo, Grant Willson, C., Ellison, Christopher J.

Journal:

Journal of Polymer Science Part B: Polymer Physics

Année:

2014

Langue:

english

Fichier:

PDF, 712 KB

english, 2014

46

Degradable Cross-Linkers and Strippable Imaging Materials for Step-and-Flash Imprint Lithography

Heath, William H., Palmieri, Frank, Adams, Jacob R., Long, Brian K., Chute, Jerred, Holcombe, Thomas W., Zieren, Shelley, Truitt, Matthew J., White, Jeffery L., Willson, C. Grant

Journal:

Année:

2008

Langue:

english

Fichier:

PDF, 374 KB

english, 2008

47

High Index Resist for 193 nm Immersion Lithography

Matsumoto, Kazuya, Costner, Elizabeth A., Nishimura, Isao, Ueda, Mitsuru, Willson, C. Grant

Journal:

Année:

2008

Langue:

english

Fichier:

PDF, 996 KB

english, 2008

48

Reduction of pattern peeling in step-and-flash imprint lithography

Takei, Satoshi, Ogawa, Tsuyoshi, Deschner, Ryan, Willson, Carlton Grant

Journal:

Microelectronic Engineering

Année:

2014

Langue:

english

Fichier:

PDF, 1.34 MB

english, 2014

49

Synthesis and Characterization of Norbornanediol Isomers and Their Fluorinated Analogues

Grayson, Scott M., Long, Brian K., Kusomoto, Shiro, Osborn, Brian P., Callahan, Ryan P., Chambers, Charles R., Willson, C. Grant

Journal:

Journal of Organic Chemistry

Année:

2006

Langue:

english

Fichier:

PDF, 126 KB

english, 2006

50

Advances in Polymer Science, 159. Statistical, Gradient, Block and Graft Copolymers by Controlled/Living Radical Polymerizations By Kelly A. Davis (University of Colorado-Boulder) and Krzysztof Matyjaszewski (Carnegie Mellon University). Springer-Verlag: Berlin, Heidelberg, New York. 2002. xii + 192 pp. $139.00. ISBN 3-540-43244-2.

Willson, C. Grant

Journal:

Journal of the American Chemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 34 KB

english, 2004